| FRP049 ポスター③ 8月2日 2Fリハーサル室 10:00-12:00 |
| KEK における多層薄膜構造の研究のための DC マグネトロンスパッタ装置 |
| DC magnetron sputtering apparatus for multilayer structure at KEK |
| ○片山 領，佐伯 学行，久保 毅幸，早野 仁司（高エネルギー加速器研究機構），岩下 芳久（京都大学），不破 康弘（日本原子力研究開発機構），佐貫 智行，佐々木 大成（東北大学） |
| ○Ryo Katayama, Takayuki Saeki, Takayuki Kubo, Hitoshi Hayano (KEK), Yoshihisa Iwashita (Kyoto University), Yasuhiro Fuwa (JAEA), Tomoyuki Sanuki, Taisei Sasaki (Tohoku University) |
| We introduced the New DC magnetron sputtering apparatus at KEK to create multi-layer structure on the inner surface of a superconducting radio-frequency cavity. This apparatus has the capability of coating Nb3Sn, NbN, and AlN to the elliptical 3 GHz SRF cavity as well as flat substrates up to the disk of 2-inch diameter. The film formation using the flat sample is useful for searching the ideal condition of film formation with various sputtering parameters. The film-formation test to the flat substrate can be done with changing the temperature of the substrate by heater. Using these functions, we will synthesize Nb3Sn-AlN-Nb and NbN-AlN-Nb structures to flat samples as well as to cavities. In the first stage, we performed the film-formation tests of the Nb and NbN thin-films, and the mixture layer of Nb, Sn and AlN. In addition, we tried to evaluate the sputtering speed and the degree of adhesion on several films of different characteristics. We will report on the film-formation apparatus and the results of several film-formation tests, and will discuss the future plan. |