| FRP48 ポスター④ 9月1日 14号館1443教室 10:10-12:10 |
| KEKにおけるニオブ薄膜スパッタ装置の開発 |
| Development of niobium sputtering apparatus at KEK |
| ○片山 領，佐伯 学行，久保 毅幸，早野 仁司，井藤 隼人（KEK），永田 智啓，伊藤 亮平（アルバック），岩下 芳久（京都大学） |
| ○Ryo Katayama, Takayuki Saeki, Takayuki Kubi, Hitoshi Hayano, Hayato Ito (KEK), Tomohiro Nagata, Ryohei Ito (ULVAC), Yoshihisa Iwashita (Kyoto-University) |
| We have been developing the Nb sputtering apparatus to coat the inner surfaces of an elliptical shape 3 GHz cavity. DC magnetron sputtering method is used in this system. We already successfully induce plasma in the chamber and coated several samples made of Cu attached to the coupon cavity as imitated the real shape of the 3 GHz cavity. This apparatus has the capability of formatting Nb thin-film as well as NbN thin-film to the inner surface of the SRF cavity. S'S structure consisting of dirty Nb or NbN on the pure bulk Nb potentially improves the maximum accelerating gradient of the ordinal Nb SRF cavity. We will report on the details of the system and obtained results, and discuss the plan based on the apparatus. |